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akaturk Academic measurement

Article detail · 2010

Polarization-engineered GaN/InGaN/GaN tunnel diodes

Journal

Applied Physics Letters

ISSN 0003-6951

YÖKSİS OpenAlex Open access · green SJR Q1 JCR Q1 Citations 153 Top 10% Percentile 97.5% FWCI 6.8
Year
2010
Type
article

Data source split

  • YÖKSİS YÖKSİS article record
  • YÖKSİS venue APPLIED PHYSICS LETTERS
  • Catalog match (ISSN) Applied Physics Letters
  • OpenAlex OpenAlex enrichment (abstract, citations, topics)

Abstract

OpenAlex · English

We report on the design and demonstration of polarization-engineered GaN/InGaN/GaN tunnel junction diodes with high current density and low tunneling turn-on voltage. Wentzel–Kramers–Brillouin calculations were used to model and design tunnel junctions with narrow band gap InGaN-based barrier layers. N-polar p-GaN/In0.33Ga0.67N/n-GaN heterostructure tunnel diodes were grown using molecular beam epitaxy. Efficient interband tunneling was achieved close to zero bias with a high current density of 118 A/cm2 at a reverse bias of 1 V, reaching a maximum current density up to 9.2 kA/cm2. These results represent the highest current density reported in III-nitride tunnel junctions and demonstrate the potential of III-nitride tunnel devices for a broad range of optoelectronic and electronic applications.

Topics

Citations

OpenAlex cited_by_count. Not a WoS or Scopus citation count; those sources have no separate column here.

153 citations

OpenAlex cited_by_count (cache / database)

Authors

  1. Sriram Krishnamoorthy
  2. Digbijoy N. Nath
  3. FATİH AKYOL YILDIZ TEKNİK ÜNİVERSİTESİ
  4. Pil Sung Park
  5. Michele Esposto
  6. Siddharth Rajan