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Makale detayı · 2010

Polarization-engineered GaN/InGaN/GaN tunnel diodes

Dergi

Applied Physics Letters

ISSN 0003-6951

YÖKSİS OpenAlex Açık erişim · green SJR Q1 JCR Q1 Atıf 153 Üst %10 Yüzdelik 97.5% FWCI 6.8
Yıl
2010
Tür
article

Veri kaynağı ayrımı

  • YÖKSİS YÖKSİS makale kaydı
  • YÖKSİS dergi adı APPLIED PHYSICS LETTERS
  • Katalog eşleşmesi (ISSN) Applied Physics Letters
  • OpenAlex OpenAlex zenginleştirmesi (özet, atıf, konular)

Özet

OpenAlex · İngilizce

We report on the design and demonstration of polarization-engineered GaN/InGaN/GaN tunnel junction diodes with high current density and low tunneling turn-on voltage. Wentzel–Kramers–Brillouin calculations were used to model and design tunnel junctions with narrow band gap InGaN-based barrier layers. N-polar p-GaN/In0.33Ga0.67N/n-GaN heterostructure tunnel diodes were grown using molecular beam epitaxy. Efficient interband tunneling was achieved close to zero bias with a high current density of 118 A/cm2 at a reverse bias of 1 V, reaching a maximum current density up to 9.2 kA/cm2. These results represent the highest current density reported in III-nitride tunnel junctions and demonstrate the potential of III-nitride tunnel devices for a broad range of optoelectronic and electronic applications.

Konular

Atıflar

OpenAlex cited_by_count. WoS veya Scopus atıf sayısı değildir; o kaynaklar için ayrı kolon yoktur.

153 atıf

OpenAlex cited_by_count (önbellek / veritabanı)

Yazarlar

  1. Sriram Krishnamoorthy
  2. Digbijoy N. Nath
  3. FATİH AKYOL YILDIZ TEKNİK ÜNİVERSİTESİ
  4. Pil Sung Park
  5. Michele Esposto
  6. Siddharth Rajan