Skip to content
akaturk Academic measurement

Article detail · 2020

Mechanisms behind slow photoresponse character of Pulsed Electron Deposited ZnO thin films

Materials Science in Semiconductor Processing

YÖKSİS ISSN 1369-8001 DOI https://linkinghub.elsevier.com/retrieve/pii/S1369800119315859 SJR Q1 JCR Q1

https://linkinghub.elsevier.com/retrieve/pii/S1369800119315859

YÖKSİS YÖKSİS article record

Abstract

No OpenAlex abstract is available for this article yet.

No OpenAlex abstract is available for this article yet.

Index information

WoS (JCR) and Scopus (SJR) quartiles by ISSN and publication year. · 2020

Scopus (SJR) / WoS (JCR)

Materials Science in Semiconductor Processing

Scopus (SJR) Q1 0,695 Year 2020
WoS (JCR) Q1 JIF 3,9 Year 2020

Universities

  • EGE ÜNİVERSİTESİ
  • İZMİR YÜKSEK TEKNOLOJİ ENSTİTÜSÜ

Authors

  1. MEHMET ÖZDOĞAN
  2. CEM ÇELEBİ İZMİR YÜKSEK TEKNOLOJİ ENSTİTÜSÜ
  3. GÖKHAN UTLU EGE ÜNİVERSİTESİ