Article detail · 2021
Effect of atomic-layer-deposited HfO2 thin-film interfacial layer on the electrical properties of Au/Ti/n-GaAs Schottky diode
YÖKSİS
OpenAlex
Open access · green
SJR Q2
JCR Q2
Citations 37
Top 10%
Percentile 93.5%
FWCI 3.45
- Year
- 2021
- Type
- article
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- YÖKSİS YÖKSİS article record
- YÖKSİS venue Journal of Materials Science: Materials in Electronics
- Catalog match (ISSN) Journal of Materials Science: Materials in Electronics
- OpenAlex OpenAlex enrichment (abstract, citations, topics)
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37 citations
OpenAlex cited_by_count (cache / database)
91 publications in the local catalog that cite this work (OpenAlex reference match; not the full global list).
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