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akaturk Akademik ölçüm

OpenAlex konusu

Optical Coatings and Gratings

Bu sayfa OpenAlex konu etiketine göre çalışmaları ve o konuda görünen akademisyenleri listeler. YÖKSİS temel alan / yan dal değildir.

OpenAlex 431 eser 8 yazar konusu

Çalışmalar

431 eser

  1. YÖKSİS SJR Q1 JCR Q2 OpenAlex üst %1 OpenAlex 99.4%

    Özet henüz yok.

  2. OpenAlex 84.1%

    We report experimental and theoretical analysis of the plasmonic resonances of Al nanoparticles and nanorods. Ordered nanoparticle arrays with well-defined shapes and narrow size distributions are fabricated on quartz substrates over large areas using extreme ultraviolet interference lithography. The structures, which…

  3. YÖKSİS SJR Q1 JCR Q1 OpenAlex üst %10 OpenAlex 98.0%

    Plasmonic nanohole arrays have received significant attention, as they have highly advantageous optical properties for ultrasensitive and label-free biosensing applications. Currently, most of these subwavelength periodic apertures are mainly implemented on transparent materials, which results in multiple spectrally c…

  4. OpenAlex üst %10 OpenAlex 98.4%

    Özet henüz yok.

  5. OpenAlex üst %10 OpenAlex 97.7%

    We analyze the influence of near-field coupling on the formation of collective plasmon modes in a multilayer metallic nanowire array. It is shown that the spectral interference between super- and subradiant normal modes results in characteristic line shape modifications which are directly controlled by the spacing as…

  6. YÖKSİS SJR Q1 JCR Q1 OpenAlex üst %10 OpenAlex 98.1%

    The authors investigate the multiple confined modes of GaAs L3 photonic crystal air-bridge cavities, using single layers of InAs quantum dots as active internal light sources. Theoretical results for the energies, quality factors, and emission polarizations of the first five modes are compared to experimental data for…

  7. SJR Q1 JCR Q1 OpenAlex üst %10 OpenAlex 96.6%

    Extreme ultraviolet (EUV, λ=13 nm) lithography is considered to be the most likely technology to follow ultraviolet (optical) lithography. One of the challenging aspects is the development of suitable resist materials and processes. This development requires the ability to produce high-resolution patterns. Until now,…

  8. YÖKSİS SJR Q2 JCR Q2 OpenAlex üst %10 OpenAlex 95.9%

    Özet henüz yok.

  9. YÖKSİS SJR Q1 JCR Q1 OpenAlex üst %10 OpenAlex 96.9%

    Sub-50 nm lines, holes, and posts have been patterned photolithographically using near-field embedded-amplitude masks and an exposing wavelength of 220 nm generated by an arc-lamp source. Interference in the optical near field is utilized to produce the fine patterns. In some cases, the feature sizes on the mask are m…

  10. OpenAlex 62.0%

    Özet henüz yok.

  11. YÖKSİS SJR Q1 JCR Q2 OpenAlex 78.8%

    Özet henüz yok.

  12. YÖKSİS SJR Q1 JCR Q1 OpenAlex 89.9%

    The greatest source of loss in conventional single-junction photovoltaic cells is their inefficient utilization of the energy contained in the full spectrum of sunlight. To overcome this deficiency, we propose a multijunction system that laterally splits the solar spectrum onto a planar array of single-junction cells…

Akademisyenler

8 akademisyen