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Makale detayı · 2010

Mechanism of Photolytic Decomposition of N Halamine Antimicrobial Siloxane Coatings

Dergi

ACS Applied Materials & Interfaces

ISSN 1944-8244

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YÖKSİS OpenAlex Açık erişim · green SJR Q1 JCR Q1 Atıf 85 Üst %10 Yüzdelik 90.3% FWCI 2.87
Yıl
2010
Tür
article

Veri kaynağı ayrımı

  • YÖKSİS YÖKSİS makale kaydı
  • YÖKSİS dergi adı ACS Applied Materials & Interfaces
  • Katalog eşleşmesi (ISSN) ACS Applied Materials and Interfaces
  • OpenAlex OpenAlex zenginleştirmesi (özet, atıf, konular)

Özet

OpenAlex · İngilizce

Generally, antimicrobial N-halamine siloxane coatings can be rehalogenated repetitively upon loss of their biocidal efficacies, a marked advantage over coatings containing other antimicrobial materials. However, the N-halamine materials tend to slowly decompose upon exposure to ultraviolet irradiation as in direct sunlight. In this work the mechanism of photolytic decomposition for the N-halamine siloxanes has been studied using spectroscopic and theoretical methods. It was found that the N-chlorinated coatings slowly decomposed upon UVA irradiation, whereas the unhalogenated coatings did not. Model compound evidence in this work suggests that upon UVA irradiation, the N-Cl bond dissociates homolytically, followed by a Cl radical migration to the alkyl side chain connected to the siloxane tethering group. An alpha and/or beta scission then occurs causing partial loss of the biocidal moiety from the surface of the coated material, thus precluding complete rechlorination. NMR, FTIR, GCMS, and computations at the DFT (U)B3LYP/6-311++G(2d,p) level of theory have been employed in reaching this conclusion.

Konular

Atıflar

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85 atıf

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Yazarlar

  1. HASAN BASRİ KOÇER
  2. AKIN AKDAĞ ORTA DOĞU TEKNİK ÜNİVERSİTESİ
  3. S D Worley
  4. Orlando Acevedo
  5. R M Broughton
  6. Yonnie Wu