Makale detayı · 2016
Atomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials
Dergi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and FilmsISSN 0734-2101
ISSN kaydı başka bir dergiye işaret ediyor; ad YÖKSİS kaydından.
- Yıl
- 2016
- Tür
- article
Veri kaynağı ayrımı
- YÖKSİS YÖKSİS makale kaydı
- YÖKSİS dergi adı Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- Katalog eşleşmesi (ISSN) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
- OpenAlex OpenAlex zenginleştirmesi (özet, atıf, konular)
Özet
İngilizce (OpenAlex)
This paper demonstrates the possible usage of TiOx thin films synthesized by atomic layer deposition as a microbolometer active material. Thin film electrical resistance is investigated as a function of thermal annealing. It is found that the temperature coefficient of resistance values can be controlled by coating/annealing processes, and the value as high as −9%/K near room temperature is obtained. The noise properties of TiOx films are characterized. It is shown that TiOx films grown by atomic layer deposition technique could have a significant potential to be used as a new active material for microbolometer-based applications.
Konular
- Transition Metal Oxide Nanomaterials
- ZnO doping and properties
- Gas Sensing Nanomaterials and Sensors
Birincil konu Transition Metal Oxide Nanomaterials