Makale detayı · 2017
Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films
- Yıl
- 2017
- ISSN
0734-2101- Tür
- article
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Özet
İngilizce (OpenAlex)
The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 °C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of −5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15–22 °C, thereby allowing a wide range of operation temperatures for the low cost microbolometers.
Konular
- Transition Metal Oxide Nanomaterials
- ZnO doping and properties
- Gas Sensing Nanomaterials and Sensors
Birincil konu Transition Metal Oxide Nanomaterials